Thermal characterization of thermally-shunted heterojunction bipolar transistors

被引:11
|
作者
Sewell, J
Liou, LL
Barlage, D
Barrette, J
Bozada, C
Dettmer, R
Fitch, R
Jenkins, T
Lee, R
Mack, M
Trombley, G
Watson, P
机构
[1] Solid State Electronics Directorate, Wright Laboratory, Wright-Patterson Air Force Base, Dayton
关键词
D O I
10.1109/55.475564
中图分类号
TM [电工技术]; TN [电子技术、通信技术];
学科分类号
0808 ; 0809 ;
摘要
Heterojunction Bipolar Transistors (HBT's) are potentially useful in a number of microwave applications, but they are severely limited by a current distribution instability caused by electrothermal interaction and the use of a low thermal conductivity substrate. A novel thermal management technique called ''thermal shunting'' has been developed to reduce thermal resistance and junction temperature non-uniformity. Thermal resistance measurements for thermally-shunted devices are presented. Specific thermal resistance measurements as low as 2.6 x 10(-4) degrees C-cm(2)/W (147 degrees C/W at 0.1 W for a device with a 177 mu m(2) emitter area) have been obtained. Thermal resistance values obtained for thermally-shunted HBT's are substantially lower than those reported for conventional HBT's.
引用
收藏
页码:19 / 21
页数:3
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