High-performance nanoporous silicon-based photodetectors

被引:6
|
作者
Thahe, Asad A. [1 ,2 ]
Bakhtiar, Hazri [1 ]
Bidin, Noriah [2 ]
Hassan, Z. [3 ]
Qaeed, M. A. [4 ]
Ramizy, Asmiet [5 ]
Talib, Zainal A. [6 ]
Ahmed, Naser M. [3 ]
Omar, Khalid [7 ]
Alciaraghuli, Hasan [8 ]
Husham, M. [9 ]
Allam, Nageh K. [10 ]
机构
[1] Univ Teknol Malaysia, Fac Sci, Phys Dept, Johor Baharu 81310, Malaysia
[2] Univ Teknol Malaysia, Inst Ibnu Sina, Laser Ctr, Skudai 81310, Johor, Malaysia
[3] USM, Inst Nano Optoelect Res & Technol, Gelugor, Penang, Malaysia
[4] Hodeidah Univ, Al Hodeidah, Yemen
[5] Anbar Univ, Dept Phys, Anbar, Iraq
[6] Univ Putra Malaysia, Fac Sci, Dept Phys, Serdang 43400, Selangor, Malaysia
[7] Univ Nizwa, Natl Chair Mat Sci & Met, POB 33,PC 616,Birkat Al Mouz, Nizwa, Oman
[8] Univ Technol Malaysia, Fac Elect Engn, Mech & Automat Control Dept, Skudai 81310, Malaysia
[9] Univ Putra Malaysia, Inst Adv Technol ITMA, Serdang 43400, Malaysia
[10] Amer Univ Cairo, Sch Sci & Engn, Energy Mat Lab, New Cairo 11835, Egypt
来源
OPTIK | 2018年 / 168卷
关键词
Porous silicon; Etching time; Electrical properties; Photodetector; POROUS SILICON; OPTICAL-PROPERTIES; FILMS; MORPHOLOGY; GROWTH;
D O I
10.1016/j.ijleo.2018.04.084
中图分类号
O43 [光学];
学科分类号
070207 ; 0803 ;
摘要
A series of porous silicon (PSi) samples was prepared using photoelectrochemical etching (PECE) method with optimum current density of 45 mA/cm(2). The as-prepared PSi samples were characterized to determine the influence of the etching time (15, 25 and 30 min) on their morphology and electrical properties. The percentage of porosity was estimated via gravimetric analysis. The band gap of the fabricated PSi was approximate to 2.22 eV. Upon their use to fabricate metal-semiconductor-metal (MSM) ultraviolet photodetectors (UVPD), the fabricated PSi revealed excellent stability and reliability under repetitive shots at 530 nm. Furthermore, very fast rise time (approximate to 0.28 s) was obtained at a bias of 1 V under visible light (530 nm) illumination. (C) 2018 Elsevier GmbH. All rights reserved.
引用
收藏
页码:424 / 431
页数:8
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