High-Performance and Radiation-Hard Carbon Nanotube Complementary Static Random-Access Memory

被引:29
|
作者
Zhu, Ma-Guang [1 ,2 ]
Zhang, Zhiyong [1 ]
Peng, Lian-Mao [1 ,2 ]
机构
[1] Peking Univ, Dept Elect, Key Lab Phys & Chem Nanodevices, Beijing 100871, Peoples R China
[2] Peking Univ, Acad Adv Interdisciplinary Studies, Beijing 100871, Peoples R China
基金
美国国家科学基金会;
关键词
carbon nanotubes; CMOS; field-effect transistors; radiation effects; SRAM; total ionizing dose; FIELD-EFFECT TRANSISTORS; CIRCUITS; TECHNOLOGIES;
D O I
10.1002/aelm.201900313
中图分类号
TB3 [工程材料学];
学科分类号
0805 ; 080502 ;
摘要
Significant progess on carbon-nanotube (CNT) electronics means that they are a serious candidate for use in high-performance integrated circuits (ICs). However, few works have focused on fabricating and exploring CNT complementary metal-oxide-semiconductor (CMOS) static random-access memory (SRAM), which is an integral part of most digital ICs. High-performance complementary top-gated field-effect transistors (FETs) are fabricated through a doping-free technology based on solution-derived CNT films and are used in SRAM cells with a high yield and high uniformity. CNT CMOS-architecture 6-transistor (6-T) SRAM exhibits read/write margins as high as approximate to 0.4 V with a supply voltage of 1.0 V and stable dynamic properties. Furthermore, the effects of radiation the CNT CMOS FETs and SRAM ICs are explored. Owing to the robust C-C bonds in the CNTs, the ultrathin gate insulator layer in the devices, and a lack of a requirement for an isolation region, CNT FETs and SRAM cells can withstand a 2.2 Mrad total ionizing dose (TID) with a high rate of 560 rad s(-1), indicating that they could be used as radiation-hard ICs for applications in hostile environments. TID hardness of CNT-based SRAM ICs is reported for the first time, and a dose of 2.2 Mrad is the highest measured radiation dose for CNT FETs and ICs.
引用
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页数:8
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