Nanomechanical and optical properties of yttrium thin films by magnetron sputtering

被引：4

作者：

Ramaseshan, R. ^{[1
]}

Sundari, S. Tripura ^{[1
]}

Balamurugan, A. K. ^{[1
]}

Dash, Sitaram ^{[1
]}

Tyagi, A. K. ^{[1
]}

Sato, Y. ^{[2
]}

Nakayama, T. ^{[2
]}

Suematsu, H. ^{[2
]}

机构：

[1] Indira Gandhi Ctr Atom Res, Mat Sci Grp, Surface & Nanosci Div, Thin Film & Coatings Sect, Kalpakkam 603102, Tamil Nadu, India

[2] Nagaoka Univ Technol, Extreme Energy Dens Res Inst, Nagaoka, Niigata 94021, Japan

来源：

OPTICS LETTERS | 2014年 / 39卷 / 11期

基金：

日本学术振兴会;

关键词：

26;

D O I：

10.1364/OL.39.003086

中图分类号：

O43 [光学];

学科分类号：

070207 ; 0803 ;

摘要：

This Letter reports on nanomechanical and optical properties of yttrium thin films deposited on an Si (100) wafer. Elemental depth profiling by a secondary ion mass spectrometer revealed absence of formation of yttrium hydride, both on the surface and beneath. The optical properties were investigated by spectroscopic ellipsometry, and the refractive indices extracted after suitable modeling were found to be 2.51 at 546 nm. Hardness and elastic modulus of these films were found to be 7 and 142 GPa, respectively. These studies indicate that yttrium thin films are suitable for x-ray mirrors, photocathode emitters in e-beam lithography, electron microscopes, and free-electron lasers. (C) 2014 Optical Society of America

引用

页码：3086 / 3089

页数：4

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