Optical properties of fluoride thin films deposited by RF magnetron sputtering

被引：30
|
作者：
Iwahori, Koichiro [1 ]
Furuta, Masahiro [1 ]
Taki, Yusuke [1 ]
Yamamura, Tomoyuki [1 ]
Tanaka, Akira [1 ]
机构：
[1] Nikon Inc, Dept Lens Engn Dev, Prod Technol Headquarters, Core Technol Ctr, Sagamihara, Kanagawa 2280828, Japan
来源：
APPLIED OPTICS | 2006年 / 45卷 / 19期
关键词：
D O I：
10.1364/AO.45.004598
中图分类号：
O43 [光学];
学科分类号：
070207 ; 0803 ;
摘要：
Fluoride thin films for 193-nm lithography were deposited by three different types of RF magnetron sputtering. Systematic analysis of the relation between optical properties and deposition conditions of these thin films is discussed. (c) 2006 Optical Society of America.
引用
收藏
页码：4598 / 4602
页数：5
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