Characterization of organic thin films for OLEDs using spectroscopic ellipsometry

被引:34
|
作者
Celli, FG
Harton, TB
Faye, O
机构
[1] Semiconduct. R. and D./Technology, Texas Instruments, Inc., M/S 147, Dallas, TX 75265
关键词
organic films; organic light emitting diodes (OLEDs); spectroscopic ellipsometry;
D O I
10.1007/s11664-997-0103-y
中图分类号
TM [电工技术]; TN [电子技术、通信技术];
学科分类号
0808 ; 0809 ;
摘要
We report the optical characterization of thin, evaporated organic films used in fabrication of organic light emitting diodes (OLEDs):N,N'-diphenyl-N,N'-bis(3-methyl-phenyl)-1,1'biphenyl-4,4'diamine, or TPD, and tris(8-hydroxy)quinolato aluminum, or Alq(3). In particular, we have obtained and analyzed spectroscopic ellipsometry (SE) data using a multi-sample approach, to determine the optical constants for Alq(3) and TPD films over the wavelength range 250-850 nm. We show that bi-layer Alq(3)/TPD films on Si can be analyzed for individual layer thicknesses, even though the refractive index is nearly identical for these films in the visible region. Simulations of in situ monitoring are also presented, which show sub-nm thickness resolution for organic layer growth on a Si monitor wafer. SE has great utility for process control, either by ex situ or in situ thickness measurement.
引用
收藏
页码:366 / 371
页数:6
相关论文
共 50 条
  • [41] Characterization of oxide films on SiC by spectroscopic ellipsometry
    Iida, T
    Tomioka, Y
    Hijikata, Y
    Yaguchi, H
    Yoshikawa, M
    Ishida, Y
    Okumura, H
    Yoshida, S
    [J]. JAPANESE JOURNAL OF APPLIED PHYSICS PART 2-LETTERS, 2000, 39 (10B): : L1054 - L1056
  • [42] Spectroscopic ellipsometry for characterization and monitoring of organic layers
    Arwin, H
    [J]. PHYSICA STATUS SOLIDI A-APPLIED RESEARCH, 2001, 188 (04): : 1331 - 1338
  • [43] Optical characterization of TiO2 thin films by the combined method of spectroscopic ellipsometry and spectroscopic photometry
    Franta, D
    Ohlídal, I
    Petrydes, D
    [J]. VACUUM, 2005, 80 (1-3) : 159 - 162
  • [44] Assessment of non-uniform thin films using spectroscopic ellipsometry and imaging spectroscopic reflectometry
    Necas, David
    Ohlidal, Ivan
    Franta, Daniel
    Cudek, Vladimi
    Ohlidal, Miloslav
    Vodak, Jiri
    Sladkova, Lucia
    Zajickova, Lenka
    Elias, Marek
    Vizd'a, Frantisek
    [J]. THIN SOLID FILMS, 2014, 571 : 573 - 578
  • [45] Investigation of Inhomogeneity of TiO2 Thin Films Using Spectroscopic Ellipsometry
    Horprathum, M.
    Kaewkhao, J.
    Eiamchai, P.
    Chindaudom, P.
    Limsuwan, P.
    [J]. 15TH INTERNATIONAL CONFERENCE ON THIN FILMS (ICTF-15), 2013, 417
  • [46] Analysis of amorphous carbon thin films by spectroscopic ellipsometry
    Lee, J
    Collins, RW
    Veerasamy, VS
    Robertson, J
    [J]. JOURNAL OF NON-CRYSTALLINE SOLIDS, 1998, 227 : 617 - 621
  • [47] Cubic CdS thin films studied by spectroscopic ellipsometry
    J. L MARTINEZ
    G MARTINEZ
    G TORRES-DELGADO
    O GUZMAN
    P. DEL ANGEL
    O ZELAYA-ANGEL
    R LOZADA-MORALES
    [J]. Journal of Materials Science: Materials in Electronics, 1997, 8 : 399 - 403
  • [48] Cubic CdS thin films studied by spectroscopic ellipsometry
    Martinez, JL
    Martinez, G
    Torres-Delgado, G
    Guzman, O
    Del Angel, P
    Zelaya-Angel, O
    Lozada-Morales, R
    [J]. JOURNAL OF MATERIALS SCIENCE-MATERIALS IN ELECTRONICS, 1997, 8 (06) : 399 - 403
  • [49] The optical characterization of organometallic complex thin films by spectroscopic ellipsometry and photovoltaic diode application
    Ozaydin, C.
    Gullu, O.
    Pakma, O.
    Ilhan, S.
    Akkilic, K.
    [J]. MATERIALS RESEARCH BULLETIN, 2016, 77 : 115 - 121
  • [50] The use of infrared spectroscopic ellipsometry for the thickness determination and molecular characterization of thin films on aluminum
    Schram, T
    Terryn, H
    [J]. JOURNAL OF THE ELECTROCHEMICAL SOCIETY, 2001, 148 (02) : F12 - F20