Hydrogen ion implantation effect on the magnetic properties of metallic multilayered films

Metallic multilayers have attracted much interest from their interesting magnetic properties. Very thin magnetic layers separated by other metallic layers show a good perpendicular magnetization anisotropy. Modification of atomic structure at the interfaces is important to study for understanding the perpendicular magnetic anisotropy. Hydrogen can be easily introduced into metals, and be used to modify the interface structure of the multilayers. In this study hydrogen ions were implanted into Co/Pt multilayered films to modify the layered structure, and change of the magnetic properties was studied. The modification of the layered structure by hydrogen ion implantation did not enhance the perpendicular magnetic anisotropy. The perpendicular magnetization anisotropy energy of the multilayered film decreased with the increase in the dose of ions implanted, and changed to an in-plane magnetization film. After evacuation of hydrogen at 100 degrees C, part of the perpendicular anisotropy was recovered. (C) 1999 Elsevier Science S.A. All rights reserved.