Lateral depletion-mode 4H-SiC n-channel junction field-effect transistors operational at 400 °C*

被引:1
|
作者
Liu, Si-Cheng [1 ,2 ]
Tang, Xiao-Yan [1 ,2 ,3 ]
Song, Qing-Wen [1 ,2 ,3 ]
Yuan, Hao [1 ,2 ]
Zhang, Yi-Meng [1 ,2 ]
Zhang, Yi-Men [1 ,2 ,3 ]
Zhang, Yu-Ming [1 ,2 ,3 ]
机构
[1] Xidian Univ, Key Lab Wide Band Gap Semicond Mat & Devices, Xian 710071, Peoples R China
[2] Xidian Univ, Sch Microelect, Xian 710071, Peoples R China
[3] XiDian WuHu Res Inst, WuHu 241000, Peoples R China
基金
美国国家科学基金会; 国家重点研发计划;
关键词
junction field-effect transistors; high temperature; 4H-SiC; depletion-mode;
D O I
10.1088/1674-1056/abc0df
中图分类号
O4 [物理学];
学科分类号
0702 ;
摘要
This paper presents the development of lateral depletion-mode n-channel 4H-SiC junction field-effect transistors (LJFETs) using double-mesa process toward high-temperature integrated circuit (IC) applications. At room temperature, the fabricated LJFETs show a drain-to-source saturation current of 23.03 mu A/mu m, which corresponds to a current density of 7678 A/cm(2). The gate-to-source parasitic resistance of 17.56 k omega . mu m is reduced to contribute only 13.49% of the on-resistance of 130.15 k omega . mu m, which helps to improve the transconductance up to 8.61 mu S/mu m. High temperature characteristics of LJFETs were performed from room temperature to 400 degrees C. At temperatures up to 400 degrees C in air, it is observed that the fabricated LJFETs still show normally-on operating characteristics. The drain-to-source saturation current, transconductance and intrinsic gain at 400 degrees C are 7.47 mu A/mu m, 2.35 mu S/mu m and 41.35, respectively. These results show significant improvement over state-of-the-art and make them attractive for high-temperature IC applications.
引用
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页数:6
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