Lateral depletion-mode 4H-SiC n-channel junction field-effect transistors operational at 400℃

被引:0
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作者
刘思成 [1 ,2 ]
汤晓燕 [1 ,2 ,3 ]
宋庆文 [1 ,2 ,3 ]
袁昊 [1 ,2 ]
张艺蒙 [1 ,2 ]
张义门 [1 ,2 ,3 ]
张玉明 [1 ,2 ,3 ]
机构
[1] Key Laboratory of Wide Band Gap Semiconductor Materials and Devices, Xidian University
[2] Xi Dian-Wu Hu Research Institute
[3] School of Microelectronics, Xidian University
基金
国家重点研发计划; 美国国家科学基金会; 中央高校基本科研业务费专项资金资助;
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中图分类号
TN386 [场效应器件];
学科分类号
0805 ; 080501 ; 080502 ; 080903 ;
摘要
This paper presents the development of lateral depletion-mode n-channel 4 H-SiC junction field-effect transistors(LJFETs) using double-mesa process toward high-temperature integrated circuit(IC) applications. At room temperature,the fabricated LJFETs show a drain-to-source saturation current of 23.03 μA/μm, which corresponds to a current density of 7678 A/cm~2. The gate-to-source parasitic resistance of 17.56 kΩ·μm is reduced to contribute only 13.49% of the on-resistance of 130.15 kΩ·μm, which helps to improve the transconductance up to 8.61 μS/μm. High temperature characteristics of LJFETs were performed from room temperature to 400℃. At temperatures up to 400℃ in air, it is observed that the fabricated LJFETs still show normally-on operating characteristics. The drain-to-source saturation current, transconductance and intrinsic gain at 400℃ are 7.47 μA/μm, 2.35 μS/μm and 41.35, respectively. These results show significant improvement over state-of-the-art and make them attractive for high-temperature IC applications.
引用
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页码:654 / 659
页数:6
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