Long-working-distance Linnik microscopic interferometry for measuring the surface profile of microstructures

被引：3

作者：

Hu, Xiaodong ^{[1
]}

Deng, Shujuan ^{[1
]}

Wang, Wenan ^{[1
]}

Hu, Xiaotang ^{[1
]}

机构：

[1] Tianjin Univ, State Key Lab Precis Measuring Technol & Instrume, Tianjin 300072, Peoples R China

来源：

JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B | 2009年 / 27卷 / 03期

关键词：

light interferometry; micromechanical devices; nanotechnology; surface structure;

D O I：

10.1116/1.3046154

中图分类号：

TM [电工技术]; TN [电子技术、通信技术];

学科分类号：

0808 ; 0809 ;

摘要：

The surface profile is an important specification that influences the performance and stability of a microelectromechanical system device. Microscopic interferometry is, up to now, the most widely used technique for surface profiles of microstructures. A long working distance is needed when it is necessary to place components such as probes or transparency windows between microstructures and the objective. In this paper, a long-working-distance Linnik microscopic interferometer system was developed for meeting above requirements. Because it is difficult to ensure that the sample and the reference objectives are completely identical, the surface profile is modulated by unmatched optical path length between measurement and reference arms. This paper puts forward compensation process for demodulating the surface profile. Experiment results show that this method can provide correct measurement of the surface profile of microstructures effectively.

引用

页码：1403 / 1407

页数：5