Cryogenic operation of 4H-SiC Schottky rectifiers

被引:0
|
作者
Shanbhag, M [1 ]
Chow, TP [1 ]
机构
[1] Rensselaer Polytech Inst, Ctr Power Elect Syst, Troy, NY 12180 USA
关键词
silicon carbide; Schottky rectifier; cryogenic; barrier inhomogeneities; Fowler-Nordheim tunneling;
D O I
暂无
中图分类号
TM [电工技术]; TN [电子技术、通信技术];
学科分类号
0808 ; 0809 ;
摘要
We report the performance of commercial 4H-SiC Schottky rectifiers at cryogenic temperatures for the first time. The Infineon rectifiers rated 300V and 600V have been tested for both forward conduction and reverse blocking at temperatures down to 77K. The barrier height decreased with temperature while the ideality factor is greater than unity implying that diffusion also plays a role in current conduction at cryogenic temperatures. A two barrier height Schottky effect has been noticed at lower temperatures indicating barrier inhomogeneities in the Schottky contacts. At lower temperatures, tunneling current played a major role in the transport process.
引用
收藏
页码:129 / 132
页数:4
相关论文
共 50 条
  • [1] Power Schottky rectifiers and microwave transistors in 4H-SiC
    Wahab, Q
    Rudner, S
    Janzén, E
    [J]. PROCEEDING OF THE TENTH INTERNATIONAL WORKSHOP ON THE PHYSICS OF SEMICONDUCTOR DEVICES, VOLS I AND II, 2000, 3975 : 668 - 671
  • [2] Investigation on barrier inhomogeneities in 4H-SiC Schottky rectifiers
    Ma, XY
    Sadagopan, P
    Sudarshan, TS
    [J]. PHYSICA STATUS SOLIDI A-APPLICATIONS AND MATERIALS SCIENCE, 2006, 203 (03): : 643 - 650
  • [3] Simulation and experimental characteristics of 4H-SiC Schottky power rectifiers
    Nigam, S
    Kim, J
    Luo, B
    Ren, F
    Chung, GY
    MacMillan, MF
    Williams, JR
    Pearton, SJ
    [J]. JOURNAL OF THE ELECTROCHEMICAL SOCIETY, 2003, 150 (01) : G1 - G5
  • [4] 4H-SiC rectifiers with dual metal planar Schottky contacts
    Vassilevski, KV
    Horsfall, AB
    Johnson, CM
    Wright, NG
    O'Neill, AG
    [J]. IEEE TRANSACTIONS ON ELECTRON DEVICES, 2002, 49 (05) : 947 - 949
  • [5] Design of high voltage 4H-SiC superjunction Schottky rectifiers
    Zhu, L
    Losee, P
    Chow, TP
    [J]. HIGH PERFORMANCE DEVICES, PROCEEDINGS, 2005, : 241 - 247
  • [6] Advanced high-voltage 4H-SiC Schottky rectifiers
    Zhu, Lin
    Chow, T. Paul
    [J]. IEEE TRANSACTIONS ON ELECTRON DEVICES, 2008, 55 (08) : 1871 - 1874
  • [7] Barrier inhomogeneities and electrical characteristics of Ti/4H-SiC Schottky rectifiers
    Defives, D
    Noblanc, O
    Dua, C
    Brylinski, C
    Barthula, M
    Aubry-Fortuna, V
    Meyer, F
    [J]. IEEE TRANSACTIONS ON ELECTRON DEVICES, 1999, 46 (03) : 449 - 455
  • [8] Electrical properties and interface reaction of annealed Cu/4H-SiC Schottky rectifiers
    Hatayama, T
    Kawahito, K
    Kijima, H
    Uraoka, Y
    Fuyuki, T
    [J]. SILICON CARBIDE AND RELATED MATERIALS 2001, PTS 1 AND 2, PROCEEDINGS, 2002, 389-3 : 925 - 928
  • [9] Characterization of deep electron traps in 4H-SiC Junction Barrier Schottky rectifiers
    Gelczuk, L.
    Dabrowska-Szata, M.
    Sochacki, M.
    Szmidt, J.
    [J]. SOLID-STATE ELECTRONICS, 2014, 94 : 56 - 60
  • [10] Effects of Ar inductively coupled plasma exposure on 4H-SiC Schottky rectifiers
    Ip, K
    Nigam, S
    Lee, KP
    Baik, KH
    Chung, GY
    MacMillan, MF
    Ren, F
    Pearton, SJ
    [J]. JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B, 2002, 20 (06): : 2299 - 2302