Thin foil acceleration by intense pulsed ion beam ablation

被引:0
|
作者
Harada, N [1 ]
Yazawa, M [1 ]
Kashine, K [1 ]
Jiang, V [1 ]
Yatsui, K [1 ]
机构
[1] Nagaoka Univ Technol, Dept Elect Engn, Nagaoka, Niigata 9402188, Japan
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TM [电工技术]; TN [电子技术、通信技术];
学科分类号
0808 ; 0809 ;
摘要
Thin foil acceleration by ablation plasma pressure produced by irradiation of intense pulsed ion beam has been studied. Acceleration process including expansion of ablation plasma was simulated based on fluid model. And interaction between incident pulsed ion beam and a thin foil target was considered as accounting stopping power of it. In experiments, we used ETIGO-II intense pulsed ion beam generator with two kinds of diodes; 1) Magnetically Insulated Diode (MID, power densities of <100 J/cm(2)) and 2) Spherical-focused Plasma Focus Diode (SPFD, power densities of up to 4.3 kJ/cm(2)). Numerical results of accelerated foil velocity agreed well with measured one over wide range of incident ion beam energy density. Foil velocity of 5.6 km/s and ablation plasma pressure of 15 GPa was demonstrated by the present experiments. Acceleration of double-layer target consists of gold/aluminum and other combinations were studied. For adequate layer thickness, such a flyer target could be much more accelerated than a single layer. Effect of waveform of ion beam was also examined. Parabolic waveform could accelerate more efficiently than rectangular waveform.
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页码:380 / 383
页数:4
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