Integrated ODP metrology with floating n&k's

被引：0
|
作者：
Kearney, Patrick [1 ]
Uchida, Junichi
Likhachev, Dmitriy [2 ]
Fleischer, Goeran [3 ]
机构：
[1] Tokyo Electron Europe Ltd, German Branch, D-01109 Dresden, Germany
[2] Timbre Technol, Santa Clara, CA USA
[3] Qimonda, Dresden, Germany
来源：
SOLID STATE TECHNOLOGY | 2009年 / 52卷 / 06期
关键词：
D O I：
暂无
中图分类号：
TM [电工技术]; TN [电子技术、通信技术];
学科分类号：
0808 ; 0809 ;
摘要：
One of the major contributions to the optical critical dimensions metrology uncertainty is the variations in optical properties (n&k's) of film stack materia Is. It is well-known that the optical properties of materials depend heavily on process conditions, such as operating conditions of deposition tools. However, in traditional approaches, n&k values have been used as fixed inputs in a scatterometry model that might result in significant metrology error. We describe an integrated scatterometry system used in a real production environment.
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页码：22 / 25
页数：4
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