Integrated ODP metrology with floating n&k's

被引：0

作者：

Kearney, Patrick ^{[1
]}

Uchida, Junichi

Likhachev, Dmitriy ^{[2
]}

Fleischer, Goeran ^{[3
]}

机构：

[1] Tokyo Electron Europe Ltd, German Branch, D-01109 Dresden, Germany

[2] Timbre Technol, Santa Clara, CA USA

[3] Qimonda, Dresden, Germany

来源：

SOLID STATE TECHNOLOGY | 2009年 / 52卷 / 06期

关键词：

D O I：

暂无

中图分类号：

TM [电工技术]; TN [电子技术、通信技术];

学科分类号：

0808 ; 0809 ;

摘要：

One of the major contributions to the optical critical dimensions metrology uncertainty is the variations in optical properties (n&k's) of film stack materia Is. It is well-known that the optical properties of materials depend heavily on process conditions, such as operating conditions of deposition tools. However, in traditional approaches, n&k values have been used as fixed inputs in a scatterometry model that might result in significant metrology error. We describe an integrated scatterometry system used in a real production environment.

引用

页码：22 / 25

页数：4

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