Modification of compact bipolar transistor model for dim (Design for Manufacturing) applications

被引:2
|
作者
Yoshitomi, S. [1 ]
Kawakyu, K. [2 ]
Teraguchi, T. [2 ]
Kimijina, H. [3 ]
Yonemura, K. [3 ]
机构
[1] Toshiba Co Ltd, Semicond Co, Grp Analog CAD Design, Div Syst LSI Dev 2,Sakae Ku, Yokohama, Kanagawa 2478585, Japan
[2] Toshiba Co Ltd, RF & Analog Digital IC Design Grp, Integrated Device Design Dept, Discrete Semicond Div,Semicond Co,Saiwai Ku, Yokohama, Kanagawa 2478585, Japan
[3] Toshiba Co Ltd, Grp Analog Proc Dev, Semicond Co, Kyusyu Works,Kokura Ku, Kitakyushu, Fukuoka 8038686, Japan
关键词
bipolar; Compact Model; HiCUM; DFM design;
D O I
10.1109/MIXDES.2006.1706552
中图分类号
TM [电工技术]; TN [电子技术、通信技术];
学科分类号
0808 ; 0809 ;
摘要
This paper describes the methodology of how to link process information with spice compact models. This is called DIM (Design For Manufacturing). We would like to propose "BJT Physical Model Card" as a solution of DFM design of BiCMOS integrated circuit. This is a SPICE compact model card of bipolar transistors (HiCUM and Gummel-Poon), which utilizes link between model parameters and few process parameters (ex. base width, base doping concentration). Experimental formulae describing the effect of doping concentration on the bulk mobility, bulk resistance and diffusion coefficient are the main heart of this card. This enables circuit engineers perform the reasonable yield analysis prior to the mass production. Two adaptation example will be shown by the use of TOSHIBA's ff=45GHz SiGe BiCMOS technology. Its applicability will be confirmed by the measurement data of single transistors and test circuit (3 stages power amplifier for 2.4GHz application).
引用
收藏
页码:125 / +
页数:2
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