A Method to Determine Dielectric Model Parameters for Broadband Permittivity Characterization of Thin Film Substrates

被引:4
|
作者
Wang, Liang [1 ,2 ,3 ]
Xia, Guangrui [1 ,4 ]
Yu, Hongyu [1 ,2 ,3 ]
机构
[1] Southern Univ Sci & Technol, Sch Microelect, Shenzhen 518055, Peoples R China
[2] Shenzhen Inst Wide Bandgap Semicond, Shenzhen 518100, Peoples R China
[3] Southern Univ Sci & Technol, Key Lab Third Generat Semicond, Shenzhen 518055, Peoples R China
[4] Univ British Columbia, Dept Mat Engn, Vancouver, BC V6T 1Z4, Canada
关键词
Complex permittivity; dielectric model; electromagnetic (EM) propagation; thin film; transmission lines;
D O I
10.1109/TEMC.2020.2989227
中图分类号
TM [电工技术]; TN [电子技术、通信技术];
学科分类号
0808 ; 0809 ;
摘要
This article introduces an efficient method to determine the dielectric model parameters of a thin film substrate from microstrip line measurements and electromagnetic analysis. The proposed method avoids using optimization algorithms which normally require extensive computation time. The complex permittivity is extracted through only one full-wave simulation. The multipole Debye model was employed to fit the extracted complex permittivity. The parameters of the best-fitting model obtained through this procedure are considered as the final results, which also ensure physically consistent characteristics. Polyimide was selected to validate the methodology. The best-fitting model generated by the proposed method has shown excellent agreement to the polyimide data sheet values at 1 MHz. Moreover, simulations using the parameters of the best-fitting model exhibit good agreement with the experimental propagation constant data of microstrip lines up to 60 GHz.
引用
收藏
页码:229 / 236
页数:8
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