Anomalous Photocurrent Characteristic at Negative Gate Bias in IGZO TFT

被引:0
|
作者
Inoue, Takayuki [1 ]
Tsubuku, Masashi [1 ]
Takahashi, Masahiro [1 ]
Miyanaga, Akiharu [1 ]
Yamazaki, Shunpei [1 ]
机构
[1] Semicond Energy Lab Co Ltd, 398 Hase, Atsugi, Kanagawa 2430036, Japan
关键词
HOMOLOGOUS COMPOUNDS; SYSTEM;
D O I
暂无
中图分类号
TM [电工技术]; TN [电子技术、通信技术];
学科分类号
0808 ; 0809 ;
摘要
We conducted light irradiation to IGZO TFT at negative bias applied to its gate and found anomalous photocurrent characteristics. On calculation model, we well reproduced this phenomenon by assuming relaxation time with different length for holes. and electrons. This analytical technique will be effective in discussing levels in the bandgap.
引用
收藏
页码:751 / 754
页数:4
相关论文
共 50 条
  • [41] 40 um-pitch IGZO TFT gate driver for high-resolution rollable AMOLED
    Jang, J., 1600, Blackwell Publishing Ltd (44):
  • [42] Analytical Surface Potential-Based Compact Model for Independent Dual Gate a-IGZO TFT
    Guo, Jingrui
    Zhao, Ying
    Yang, Guanhua
    Chuai, Xichen
    Lu, Wenhao
    Liu, Dongyang
    Chen, Qian
    Duan, Xinlv
    Huang, Shijie
    Su, Yue
    Geng, Di
    Lu, Nianduan
    Cui, Tao
    Jang, Jin
    Li, Ling
    Liu, Ming
    IEEE TRANSACTIONS ON ELECTRON DEVICES, 2021, 68 (04) : 2049 - 2055
  • [43] High-Current-Drive Dual-Gate a-IGZO TFT With Nanometer Dotlike Doping
    Liao, Chun-Hung
    Li, Chang-Hung
    Zan, Hsiao-Wen
    Meng, Hsin-Fei
    Tsai, Chuang-Chuang
    IEEE ELECTRON DEVICE LETTERS, 2013, 34 (10) : 1274 - 1276
  • [45] High-Speed Dual-Gate a-IGZO TFT-Based Circuits With Top-Gate Offset Structure
    Li, Xiuling
    Geng, Di
    Mativenga, Mallory
    Jang, Jin
    IEEE ELECTRON DEVICE LETTERS, 2014, 35 (04) : 461 - 463
  • [46] Gate Bias Stress-Induced Threshold Voltage Shift Effect of a-IGZO TFTs with Cu Gate
    Liu, Xiang
    Wang, Lisa Ling
    Ning, Ce
    Hu, Hehe
    Yang, Wei
    Wang, Ke
    Yoo, Seong Yeol
    Zhang, Shengdong
    IEEE TRANSACTIONS ON ELECTRON DEVICES, 2014, 61 (12) : 4299 - 4303
  • [47] The Gate-Bias Influence for ESD Characteristic of NMOS
    Liu, Juan
    Fan, Hang
    Li, Jianguo
    Jiang, Lingli
    Zhang, Bo
    2009 IEEE 8TH INTERNATIONAL CONFERENCE ON ASIC, VOLS 1 AND 2, PROCEEDINGS, 2009, : 1047 - 1050
  • [48] Bias stress instability of double-gate a-IGZO TFTs on polyimide substrate
    Won-Ju Cho
    Min-Ju Ahn
    Journal of the Korean Physical Society, 2017, 71 : 325 - 328
  • [49] Bias stress instability of double-gate a-IGZO TFTs on polyimide substrate
    Cho, Won-Ju
    Ahn, Min-Ju
    JOURNAL OF THE KOREAN PHYSICAL SOCIETY, 2017, 71 (06) : 325 - 328
  • [50] Bipolar charge trapping induced anomalous negative bias-temperature instability in HfSiON gate dielectric pMOSFETs
    Tang, Chun-Jung
    Ma, Huan-Chi
    Wang, Tahui
    Chan, Chien-Tai
    Chang, Chih-Sheng
    IEEE TRANSACTIONS ON DEVICE AND MATERIALS RELIABILITY, 2007, 7 (04) : 518 - 523