The morphology of unconventional sputter deposited Ba(1-x)SrxTiO3 thin films

被引：0
|
作者：
Cukauskas, EJ [1 ]
Kirchoefer, SW [1 ]
Pond, JM [1 ]
机构：
[1] USN, Res Lab, Div Elect Sci & Technol, Washington, DC 20375 USA
来源：
FERROELECTRICS | 2001年 / 256卷
关键词：
barium strontium titanate; ferroelectrics; dielectric; thin films; sputtering Classified scheme : 77.55.+f; 81.15.Cd; 61.10.-i and 85.50.-j;
D O I：
10.1080/00150190108015978
中图分类号：
T [工业技术];
学科分类号：
08 ;
摘要：
Thin films of Ba(1-x)SrxTiO3 (BST) have been deposited on (100) MgO substrates by off-axis cosputtering targets of SrTiO3 and BaTiO3 for several Ba/Sr metals fractions. The surface morphology and crystal structure were strongly dependent on the Ba/Sr metals fraction. For small x values (< 0.3), the films were multi-textured and of a tetragonal structure. At greater x, the films became predominantly (110) orientated and for x > 0.5 became strongly (200) orientated. The surface roughness was smooth for x < 0.5 and became progressively rougher with increasing x (greater Sr). Interdigitated capacitors fabricated on these films showed greater tuning for films having low x values and greater Q for those having higher x values. A comparison of the lattice parameter with that for bulk BST shows the films to be under compressive stress for x < 0.45 and under tensile stress for x > 0.45. This film stress has a strong influence on the Curie temperature and the resulting dielectric properties of the films.
引用
收藏
页码：113 / 128
页数：16
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