共 50 条
- [1] High-frequency characteristics of PMOS transistors with raised SiGe source/drain 2001 TOPICAL MEETING ON SILICON MONOLITHIC INTEGRATED CIRCUITS IN RF SYSTEMS, DIGEST OF PAPERS, 2001, : 92 - 95
- [3] High Ge Content SiGe Selective Processes For Manufacturing Source/Drain In The Next Generations of pMOS Transistors SIGE, GE, AND RELATED COMPOUNDS 5: MATERIALS, PROCESSING, AND DEVICES, 2012, 50 (09): : 807 - 814
- [5] RF performance degradation in PMOS transistors due to hot carrier and soft breakdown effects 2004 Topical Meeting on Silicon Monolithic Integrated Circuits in RF Systems, Digest of Papers, 2004, : 309 - 310
- [7] Integration of Highly Strained SiGe in Source and Drain with HK and MG for 22 nm Bulk PMOS Transistors NANOSCALE RESEARCH LETTERS, 2017, 12
- [9] Integration of Highly Strained SiGe in Source and Drain with HK and MG for 22 nm Bulk PMOS Transistors Nanoscale Research Letters, 2017, 12
- [10] Modeling PIN Diodes for High Power RF and Microwave Applications 2009 IEEE/MTT-S INTERNATIONAL MICROWAVE SYMPOSIUM, VOLS 1-3, 2009, : 897 - 900