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- [3] Transient electrochemical processes during Cu-Ni deposition (vol 81, pg 55, 2003) TRANSACTIONS OF THE INSTITUTE OF METAL FINISHING, 2003, 81 : B54 - B54
- [4] Good ferroelectricity of Pb(Zr,Ti)O3 thin films fabricated by highly reproducible deposition on bottom Ir electrode at 395°C (vol 42, pg 1085, 2003) JAPANESE JOURNAL OF APPLIED PHYSICS PART 2-LETTERS & EXPRESS LETTERS, 2003, 42 (11A): : L1346 - L1346
- [6] Electrochemical Synthesis and Deposition of Surface-Enhanced Raman Scattering-Active Silver Microstructures on a Screen-Printed Carbon Electrode (vol 37, pg 24865, 2015) JOURNAL OF PHYSICAL CHEMISTRY C, 2017, 121 (03): : 2023 - 2023
- [9] Amorphous silicon film deposition by low temperature catalytic chemical vapor deposition (<150°C) and laser crystallization for polycrystalline silicon thin-film transistor application (vol 45, pg 227, 2006) JAPANESE JOURNAL OF APPLIED PHYSICS PART 2-LETTERS & EXPRESS LETTERS, 2006, 45 (17-19): : L485 - L485