Using notch-filter masks for high-contrast imaging of extrasolar planets

被引：10
|
作者：
Debes, JH
Ge, J
Kuchner, MJ
Rogosky, M
机构：
[1] Penn State Univ, Dept Astron & Astrophys, University Pk, PA 16802 USA
[2] Princeton Univ, Dept Astrophys Sci, Princeton, NJ 08544 USA
[3] Penn State Univ, Nanofabricat Facil, University Pk, PA 16802 USA
来源：
ASTROPHYSICAL JOURNAL | 2004年 / 608卷 / 02期
关键词：
circumstellar matter; instrumentation : adaptive optics methods : laboratory; planetary systems;
D O I：
10.1086/420734
中图分类号：
P1 [天文学];
学科分类号：
0704 ;
摘要：
We present the first laboratory experiments using a notch-filter mask, a coronagraphic image mask that can produce infinite dynamic range in an ideal Lyot coronagraph, according to scalar diffraction theory. We fabricated the first notch-filter mask prototype with 0.25 mum precision using an electron-beam lithography machine. Our initial optical tests show that the prototype masks generate contrast levels of 10(-5) at 3lambda/D and 10(-6) at similar to8lambda/D, with a throughput of 27%. We speculate on the "as-is" perfomance of such a mask in the Hubble Space Telescope.
引用
收藏
页码：1095 / 1099
页数：5
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