Indium clusters on the Ge(5x5) wetting layer of Si(111)-7x7

被引:4
|
作者
MacLeod, J. M. [1 ]
Psiachos, D. [1 ]
Stott, M. J. [1 ]
McLean, A. B. [1 ]
机构
[1] Queens Univ, Dept Phys, Kingston, ON K7L 3N6, Canada
关键词
D O I
10.1103/PhysRevB.73.241306
中图分类号
T [工业技术];
学科分类号
08 ;
摘要
The adsorption of In on the Si(111)-Ge(5x5) surface reconstruction has been studied with scanning tunneling microscopy and ab initio calculations to investigate the possibility of using this reconstruction as a template for cluster formation. As with In adsorption on Si(111)-7x7 at low substrate temperatures and low In fluences, the In adatoms are found to preferentially adsorb on the faulted half-unit cell. However, in contrast to In adsorption on Si(111)-7x7, the In adatoms are also frequently found in the unfaulted half-unit cell at low coverages. The filling of unfaulted unit cell halves is primarily due to the formation of large clusters that span multiple substrate half-unit cells. Moreover, many of the faulted half-unit cells have a streaked appearance that indicates that surface atoms within them are mobile.
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页数:4
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