Contacts to GaAs, InP, and GaP for high-temperature and high-power applications

被引:0
|
作者
Lee, PP [1 ]
Hwu, RJ [1 ]
Sadwick, LP [1 ]
Kumar, BR [1 ]
Chern, JH [1 ]
Lin, CH [1 ]
Balasubramaniam, H [1 ]
机构
[1] Univ Utah, Dept Elect Engn, Salt Lake City, UT 84112 USA
来源
关键词
DyP; DyAs; rare-earth compound; semi-metallic; Schottky contacts; high-temperature contacts;
D O I
10.1117/12.370167
中图分类号
TP3 [计算技术、计算机技术];
学科分类号
0812 ;
摘要
There is a significant interest in the area of improving high temperature stable contacts to m-V semiconductors. Two attractive materials that offer promise in this area are dysprosium phosphide (DyP) and dysprosium arsenide (DyAs). This paper reports the electrical characterization of MBE-grown DyP and DyAs on GaAs, Cap, and InP substrates. The characterization methods include Hall and I-V measurements. DyP is lattice matched to GaAs, with a room temperature mismatch of less than 0.01% and is stable in air with no sign of oxidation, even after months of ambient exposure. DyP forms Schottky contacts to n-GaAs, n- and p-GaP, and p-InP with barrier heights of 0.81, 0.9, 0.8, and 0.74 eV, respectively. DyP on n-InP and p-GaAs is found to have ohmic behavior with the specific contact resistance of 1x10(-4) and 2.9x10(-5) Ohm.cm(2), respectively. DyAs also forms Schottky contacts to n-GaAs, p-GaP, and p-InP and forms ohmic contacts to n-InP.
引用
收藏
页码:217 / 222
页数:6
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