Identifying a doping type of semiconductor nanowires by photoassisted kelvin probe force microscopy as exemplified for GaN nanowires

被引:24
|
作者
Sun, Xiaoxiao [1 ]
Wang, Xinqiang [1 ,2 ]
Wang, Ping [1 ]
Sheng, Bowen [1 ]
Li, Mo [3 ]
Su, Juan [3 ]
Zhang, Jian [3 ]
Liu, Fang [1 ]
Rong, Xin [1 ]
Xu, Fujun [1 ]
Yang, Xuelin [1 ]
Qin, Zhixin [1 ]
Ge, Weikun [1 ]
Shen, Bo [1 ,2 ]
机构
[1] Peking Univ, Sch Phys, State Key Lab Artificial Microstruct & Mesosccop, Beijing 100871, Peoples R China
[2] Collaborat Innovat Ctr Quantum Matter, Beijing 100871, Peoples R China
[3] Microsyst & Terahertz Res Ctr, 596,Yinhe Rd, Chengdu 610200, Peoples R China
来源
OPTICAL MATERIALS EXPRESS | 2017年 / 7卷 / 03期
基金
中国国家自然科学基金;
关键词
JUNCTION DIODE;
D O I
10.1364/OME.7.000904
中图分类号
T [工业技术];
学科分类号
08 ;
摘要
It remains a challenge to characterize the doping type in nanowires (NWs). We report in this paper a novel way to probe the doping type in GaN NWs by photoassisted kelvin probe force microscopy (KPFM), as a proper example showing that this approach is straight forward, effective and practical. Through illumination with super-bandgap light, photo-generated electrons in the n-region are swept away from the surface due to the electric field in the space-charge region, thus the holes move to the surface; while in contrast, electrons in the p-region will move to the surface. The fact that the quasi-Fermi level moves upwards in n-type while downwards in p-type identifies the doping type of GaN NWs, and is clearly revealed by the contact potential difference detected by photoassisted KPFM. (C) 2017 Optical Society of America
引用
收藏
页码:904 / 912
页数:9
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