Surface structure of Pt/Si(001)

被引：10
|
作者：
Choi, DS [1 ]
Jung, JW
Shin, DS
Yoon, MS
Cho, WS
Kim, JY
Chae, KH
Jeong, KH
Whang, CN
机构：
[1] Kangweon Natl Univ, Dept Phys, Chunchon 200701, Kangwondo, South Korea
[2] Yonsei Univ, Dept Phys, Seoul 120749, South Korea
[3] Yonsei Univ, Atom Scale Surface Sci Ctr, Seoul 120749, South Korea
来源：
SURFACE SCIENCE | 2002年 / 505卷 / 1-3期
关键词：
low energy ion scattering (LEIS); silicon; platinum; surface structure; morphology; roughness; and topography; chemisorption;
D O I：
10.1016/S0039-6028(02)01373-0
中图分类号：
O64 [物理化学（理论化学）、化学物理学];
学科分类号：
070304 ; 081704 ;
摘要：
We have investigated Pt adsorption on the Si(001) surface using LEED and low energy ion scattering spectroscopy (ISS). We observe a c(4 x 2) LEED image at annealing temperatures between 700 and 1150 degreesC. For annealing temperatures between 800 and 1000 degreesC a c(4 x 6) LEED image is observed simultaneously with the c(4 x 2) LEED image. The Pt/Si(001) surface structure does not depend on the initial Pt coverage. We also measure the adsorption site at the c(4 x 2) surface using the ISS. We find that the Pt atoms are adsorbed at T3 sites and some Pt atoms diffuse into the bulk. The height of the adsorbed Pt atoms from the Si surface is determined to be 0.5 Angstrom. (C) 2002 Elsevier Science B,V. All rights reserved.
引用
收藏
页码：L222 / L226
页数：5
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