Preparation and characterization of electrodeposited high-Bs CoNiFe thin films with high resistivity and improvement of their corrosion resistance

被引：0
|
作者：
Kaseda, M [1 ]
Yamada, M [1 ]
Nakanishi, T [1 ]
Osaka, T [1 ]
机构：
[1] Waseda Univ, Sch Sci & Engn, Dept Appl Chem, Shinjuku Ku, Tokyo 1698555, Japan
来源：
ELECTROCHEMICAL TECHNOLOGY APPLICATIONS IN ELECTRONICS III | 2000年 / 99卷 / 34期
关键词：
D O I：
暂无
中图分类号：
O646 [电化学、电解、磁化学];
学科分类号：
081704 ;
摘要：
In order to increase the resistivity of electrodeposited high-B-s CoNiFe thin film, an organic additive such as diethylenetriamine (DET) was added to the plating bath. The desirable soft magnetic CoNiFe film with higher rho value of 95 mu Omega-cm was developed by the carbon inclusion from the new bath containing DET. The CoNiFe thin film with high rho value exhibited the excellent frequency-dependence of the permeability. Although high-rho CoNiFe thin film did not show the sufficient corrosion resistance, annealing at 250 degrees C for one hour in vacuum led to higher anticorrosion property.
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页码：263 / 272
页数：10
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