In order to increase the resistivity of electrodeposited high-B-s CoNiFe thin film, an organic additive such as diethylenetriamine (DET) was added to the plating bath. The desirable soft magnetic CoNiFe film with higher rho value of 95 mu Omega-cm was developed by the carbon inclusion from the new bath containing DET. The CoNiFe thin film with high rho value exhibited the excellent frequency-dependence of the permeability. Although high-rho CoNiFe thin film did not show the sufficient corrosion resistance, annealing at 250 degrees C for one hour in vacuum led to higher anticorrosion property.
机构:
Waseda Univ, Dept Appl Chem, Sch Sci & Engn, Kagami Mem Lab Mat Sci & Technol,Shinjuku Ku, Tokyo 1698555, JapanWaseda Univ, Dept Appl Chem, Sch Sci & Engn, Kagami Mem Lab Mat Sci & Technol,Shinjuku Ku, Tokyo 1698555, Japan
Mizutani, S
Yokoshima, T
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机构:Waseda Univ, Dept Appl Chem, Sch Sci & Engn, Kagami Mem Lab Mat Sci & Technol,Shinjuku Ku, Tokyo 1698555, Japan
Yokoshima, T
Nam, HS
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Nam, HS
Nakanishi, T
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机构:Waseda Univ, Dept Appl Chem, Sch Sci & Engn, Kagami Mem Lab Mat Sci & Technol,Shinjuku Ku, Tokyo 1698555, Japan
Nakanishi, T
Osaka, T
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机构:Waseda Univ, Dept Appl Chem, Sch Sci & Engn, Kagami Mem Lab Mat Sci & Technol,Shinjuku Ku, Tokyo 1698555, Japan
Osaka, T
Yamazaki, Y
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机构:Waseda Univ, Dept Appl Chem, Sch Sci & Engn, Kagami Mem Lab Mat Sci & Technol,Shinjuku Ku, Tokyo 1698555, Japan
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Waseda Univ, Sch Sci & Engn, Dept Appl Chem, Kagami Mem Lab Mat Sci & Technol,Shinjuku Ku, Tokyo 1698555, JapanWaseda Univ, Sch Sci & Engn, Dept Appl Chem, Kagami Mem Lab Mat Sci & Technol,Shinjuku Ku, Tokyo 1698555, Japan
Yokoshima, T
Kaseda, M
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Waseda Univ, Sch Sci & Engn, Dept Appl Chem, Kagami Mem Lab Mat Sci & Technol,Shinjuku Ku, Tokyo 1698555, JapanWaseda Univ, Sch Sci & Engn, Dept Appl Chem, Kagami Mem Lab Mat Sci & Technol,Shinjuku Ku, Tokyo 1698555, Japan
Kaseda, M
Yamada, M
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Waseda Univ, Sch Sci & Engn, Dept Appl Chem, Kagami Mem Lab Mat Sci & Technol,Shinjuku Ku, Tokyo 1698555, JapanWaseda Univ, Sch Sci & Engn, Dept Appl Chem, Kagami Mem Lab Mat Sci & Technol,Shinjuku Ku, Tokyo 1698555, Japan
Yamada, M
Nakanishi, T
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Waseda Univ, Sch Sci & Engn, Dept Appl Chem, Kagami Mem Lab Mat Sci & Technol,Shinjuku Ku, Tokyo 1698555, JapanWaseda Univ, Sch Sci & Engn, Dept Appl Chem, Kagami Mem Lab Mat Sci & Technol,Shinjuku Ku, Tokyo 1698555, Japan
机构:
Sri Ramakrishna Mission Vidyalaya Coll Arts & Sci, Dept Phys, Coimbatore 641020, Tamil Nadu, IndiaSri Ramakrishna Mission Vidyalaya Coll Arts & Sci, Dept Phys, Coimbatore 641020, Tamil Nadu, India
Mariappan, R.
Mahalingam, T.
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Alagappa Univ, Dept Phys, Karaikkudi 630003, Tamil Nadu, IndiaSri Ramakrishna Mission Vidyalaya Coll Arts & Sci, Dept Phys, Coimbatore 641020, Tamil Nadu, India
Mahalingam, T.
Ponnuswamy, V.
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Sri Ramakrishna Mission Vidyalaya Coll Arts & Sci, Dept Phys, Coimbatore 641020, Tamil Nadu, IndiaSri Ramakrishna Mission Vidyalaya Coll Arts & Sci, Dept Phys, Coimbatore 641020, Tamil Nadu, India