Acrylic-based resin with favorable properties for three-dimensional two-photon polymerization

被引：148
|
作者：
Baldacchini, T
LaFratta, CN
Farrer, RA
Teich, MC
Saleh, BEA
Naughton, MJ
Fourkas, JT [1 ]
机构：
[1] Boston Coll, Eugene F Merkert Chem Ctr, Chestnut Hill, MA 02467 USA
[2] Boston Univ, Dept Elect & Comp Engn, Quantum Imaging Lab, Boston, MA 02215 USA
[3] Boston Coll, Dept Phys, Chestnut Hill, MA 02467 USA
来源：
JOURNAL OF APPLIED PHYSICS | 2004年 / 95卷 / 11期
关键词：
D O I：
10.1063/1.1728296
中图分类号：
O59 [应用物理学];
学科分类号：
摘要：
We describe an acrylic-based prepolymer resin that is ideally suited for the fabrication of three-dimensional structures with two-photon polymerization. We characterize the photochemical and photophysical properties of the photoinitiator and present representative structures that demonstrate the favorable mechanical and optical properties of the polymer. (C) 2004 American Institute of Physics.
引用
收藏
页码：6072 / 6076
页数：5
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