Synthesis and Characteristics of Zn-Doped CuCrO2 Transparent Conductive Thin Films

被引:6
|
作者
Yu, Ruei-Sung [1 ,2 ]
Chu, Chen [1 ]
机构
[1] Asia Univ, Dept Photon & Commun Engn, 500 Lioufeng Rd, Taichung 41354, Taiwan
[2] China Med Univ, China Med Univ Hosp, Dept Med Res, Taichung 40402, Taiwan
来源
COATINGS | 2019年 / 9卷 / 05期
关键词
CuCrO2; zinc-doped; thin film; structure; optoelectronic properties; PULSED-LASER DEPOSITION; P-N-JUNCTIONS; FABRICATION;
D O I
10.3390/coatings9050321
中图分类号
T [工业技术];
学科分类号
08 ;
摘要
The effects of doping a p-type CuCrO2 film with zinc on its structural and optoelectronic properties were investigated by experiments using CuCr1-xZnxO2 thin films (x = 0, 0.025, 0.065, 0.085). An increase in the amount of zinc dopant in the thin films affected the lattice constant and increased its Gibbs free energy of phase transformation. Cross-sectional images of the CuCrO2 thin film samples exhibited a dense polygonal microstructure and a surface morphology with protruding nanoscale granules. With the increase in the amount of Zn dopant, the surface roughness decreased, thereby increasing the amount of incident photons as well as the visible-light transmittance and ultraviolet-light absorption of the thin films. With the zinc doping in the CuCrO2 thin films, the band gap increased from 3.09 to 3.11 eV. The substitution of Cr3+ with Zn2+ forms hole carriers in the crystals, which was demonstrated by X-ray photoelectron spectroscopy and Hall effect measurements. The conductivities and carrier concentrations of the Zn-doped CuCrO2 thin films were greater than those of undoped CuCrO2. The CuCr1-xZnxO2 film (x = 0.065) exhibited the best optoelectronic properties; its carrier concentration and resistivity were 1.88 x 10(17) cm(-3) and 3.82 Omega cm, respectively.
引用
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页数:11
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