Improved crystallinity of GaInNAs by additional rapid thermal annealing (RTA)

被引：0
|
作者：
Kondow, M [1 ]
Kitatani, T [1 ]
Aoki, M [1 ]
Nakatsuka, S [1 ]
Kudo, M [1 ]
机构：
[1] Hitachi Ltd, RWCP Optoelect Hitachi Lab, Cent Res Lab, Kokubunji, Tokyo 185, Japan
来源：
LEOS 2001: 14TH ANNUAL MEETING OF THE IEEE LASERS & ELECTRO-OPTICS SOCIETY, VOLS 1 AND 2, PROCEEDINGS | 2001年
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D O I：
暂无
中图分类号：
TM [电工技术]; TN [电子技术、通信技术];
学科分类号：
0808 ; 0809 ;
摘要：
引用
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页码：622 / 623
页数：2
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