Orthogonal polynomials describing polarization aberration for rotationally symmetric optical systems

被引:16
|
作者
Xu, Xiangru [1 ,3 ]
Huang, Wei [1 ,2 ]
Xu, Mingfei [1 ,3 ]
机构
[1] Chinese Acad Sci, Changchun Inst Opt Fine Mech & Phys, Changchun 130033, Jilin, Peoples R China
[2] State Key Lab Appl Opt, Changchun 130033, Jilin, Peoples R China
[3] Univ Chinese Acad Sci, Beijing 100039, Peoples R China
来源
OPTICS EXPRESS | 2015年 / 23卷 / 21期
关键词
IMPACT;
D O I
10.1364/OE.23.027911
中图分类号
O43 [光学];
学科分类号
070207 ; 0803 ;
摘要
Optical lithography has approached a regime of high numerical aperture and wide field, where the impact of polarization aberration on imaging quality turns to be serious. Most of the existing studies focused on the distribution rule of polarization aberration on the pupil, and little attention had been paid to the field. In this paper, a new orthonormal set of polynomials is established to describe the polarization aberration of rotationally symmetric optical systems. The polynomials can simultaneously reveal the distribution rules of polarization aberration on the exit pupil and the field. Two examples are given to verify the polynomials. (C) 2015 Optical Society of America
引用
收藏
页码:27911 / 27919
页数:9
相关论文
共 50 条
  • [1] Orthonormal polynomials describing polarization aberration for M-fold optical systems
    Xu, Xiangru
    Huang, Wei
    Xu, Mingfei
    [J]. OPTICS EXPRESS, 2016, 24 (05): : 4906 - 4912
  • [2] DIFFRACTION ANALYSIS OF ROTATIONALLY SYMMETRIC OPTICAL-SYSTEMS USING COMPUTER-GENERATED ABERRATION POLYNOMIALS
    TAM, SC
    LEWIS, GDW
    DORIC, S
    HESHMATYMANESH, D
    [J]. APPLIED OPTICS, 1983, 22 (08): : 1181 - 1187
  • [3] Polarization Aberration of a Non-Rotationally Symmetric Optical System With Freeform Surfaces
    Zhang, Yilan
    Shi, Haodong
    Jiang, Huilin
    [J]. IEEE ACCESS, 2021, 9 : 145538 - 145553
  • [4] Polarization aberrations of transmitting rotationally symmetric optical systems
    Zhang, Ying
    Zhao, Hui-Jie
    Xing, Hui
    Cheng, Xuan
    [J]. Guangxue Jingmi Gongcheng/Optics and Precision Engineering, 2009, 17 (04): : 757 - 763
  • [5] SYMMETRIC SYSTEMS OF ORTHOGONAL POLYNOMIALS
    MEIXNER, J
    [J]. ARCHIVE FOR RATIONAL MECHANICS AND ANALYSIS, 1971, 44 (01) : 69 - &
  • [6] An analytic expression for the field dependence of Zernike polynomials in rotationally symmetric optical systems
    Gray, Robert W.
    Dunn, Christina
    Thompson, Kevin P.
    Rolland, Jannick P.
    [J]. OPTICS EXPRESS, 2012, 20 (15): : 16436 - 16449
  • [7] Simplified analysis and suppression of polarization aberration in planar symmetric optical systems
    Wang, Kaikai
    Fu, Qiang
    Wang, Boshi
    Shi, Haodong
    Liu, Jianan
    Wang, Qi
    Wang, Chao
    [J]. OPTICS EXPRESS, 2023, 31 (19) : 30750 - 30766
  • [8] ABERRATION BALANCING IN ROTATIONALLY SYMMETRIC LENSES
    TATIAN, B
    [J]. JOURNAL OF THE OPTICAL SOCIETY OF AMERICA, 1974, 64 (08) : 1083 - 1091
  • [9] ABERRATION BALANCING IN ROTATIONALLY SYMMETRIC LENSES
    TATIAN, B
    [J]. JOURNAL OF THE OPTICAL SOCIETY OF AMERICA, 1973, 63 (10) : 1295 - 1295
  • [10] Optical design with orthogonal representations of rotationally symmetric and freeform aspheres
    Menke, Christoph
    Forbes, G. W.
    [J]. ADVANCED OPTICAL TECHNOLOGIES, 2013, 2 (01) : 97 - 109