Fabrication of high quality ferromagnetic Josephson junctions

被引：25
|
作者：
WeideS, M
Tillmann, K
Kohstedt, H
机构：
[1] Res Ctr Juelich, Inst Solid State Res, D-52425 Julich, Germany
[2] Res Ctr Juelich, Ctr Nanoelect Syst Informat Technol, CNI, D-52425 Julich, Germany
[3] Res Ctr Juelich, Ctr Microscopy & Spect Electrons, D-52425 Julich, Germany
[4] Univ Calif Berkeley, Dept Mat Sci & Engn, Berkeley, CA 94720 USA
[5] Univ Calif Berkeley, Dept Phys, Berkeley, CA 94720 USA
来源：
PHYSICA C-SUPERCONDUCTIVITY AND ITS APPLICATIONS | 2006年 / 437-38卷
关键词：
Josephson junctions; pi-contact; superconductor ferromagnet superconductor junctions;
D O I：
10.1016/j.physc.2005.12.046
中图分类号：
O59 [应用物理学];
学科分类号：
摘要：
We present ferromagnetic Nb/Al2O3/Ni60Cu40/Nb Josephson junctions (SIFS) with an ultrathin Al2O3 tunnel barrier. The junction fabrication was optimized regarding junction insulation and homogeneity of current transport. Using ion-beam-etching and anodic oxidation we defined and insulated the junction mesas. The additional 2 nm thin Cu-layer below the ferromagnetic NiCu (SINFS) lowered interface roughness and ensured very homogeneous current transport. A high yield of junctional devices with j(c) spreads less than 2% was obtained. (c) 2005 Elsevier B.V. All rights reserved.
引用
收藏
页码：349 / 352
页数：4
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