Patterned Growth of Horizontal ZnO Nanowire Arrays

被引：92

作者：

Xu, Sheng ^{[1
]}

Ding, Yong ^{[1
]}

Wei, Yaguang ^{[1
]}

Fang, Hao ^{[1
]}

Shen, Yue ^{[1
]}

Sood, Ashok K. ^{[2
]}

Polla, Dennis L. ^{[3
]}

Wang, Zhong Lin ^{[1
]}

机构：

[1] Georgia Inst Technol, Sch Mat Sci & Engn, Atlanta, GA 30332 USA

[2] Magnolia Opt Technol Inc, Woburn, MA 01801 USA

[3] DARPA MTO, Arlington, VA 22203 USA

来源：

JOURNAL OF THE AMERICAN CHEMICAL SOCIETY | 2009年 / 131卷 / 19期

关键词：

NANORODS; TEMPERATURE;

D O I：

10.1021/ja902119h

中图分类号：

O6 [化学];

学科分类号：

0703 ;

摘要：

We report an approach to fabricating patterned horizontal ZnO nanowire arrays with a high degree of control over their dimensionality, orientation, and uniformity. Our method combines electron beam lithography and a low temperature hydrothermal decomposition. This approach opens up possibilities to fabricate ZnO NW array based strain and force sensors, two-dimensional photonic crystals, integrated circuit interconnects, and alternative current nanogenerators.

引用

页码：6670 / +

页数：3

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