A New Si/TiO2/Pt p-n Junction Semiconductor to Demonstrate Photoelectrochemical CO2 Conversion

被引:53
|
作者
Guaraldo, Thais Tasso [1 ,2 ]
de Brito, Juliana Ferreira [1 ]
Wood, David [2 ]
Boldrin Zanoni, Maria Valnice [1 ]
机构
[1] UNESP, Chem Inst Araraquara, R Francisco Degni 55, BR-14800060 Araraquara, SP, Brazil
[2] Univ Durham, Sch Engn & Comp Sci, Durham DH1 3LE, England
基金
巴西圣保罗研究基金会;
关键词
Si/TiO2/Pt; heterojunction; CO2; reduction; photoelectrocatalysis; ENHANCED PHOTOELECTROCATALYTIC DEGRADATION; ELECTROCHEMICAL REDUCTION; CARBON-DIOXIDE; TIO2; ELECTRODES; PHOTOCATALYSTS; PHOTOCATHODE; COMPOSITE; ARRAYS; ACID;
D O I
10.1016/j.electacta.2015.10.077
中图分类号
O646 [电化学、电解、磁化学];
学科分类号
081704 ;
摘要
This work presents a new Si/TiO2/Pt p-n junction semiconductor prepared by sputtering, chemical vapor deposition (CVD), photolithography and lift-off techniques. XRD, EDS, FE-SEM, diffuse reflectance (DRS) and photocurrent vs potential curves had been used for semiconductor characterization. The material was designed for high porosity and uniformity of both TiO2 and Pt deposits; both TiO2 anatase phase formation and Pt presence were confirmed. This semiconductor has a characteristic of high light absorption in the ultraviolet and visible regions. A good photocurrent response for the cathodic region was obtained in a CO2 saturated solution (-1.0 mA under -0.8 V and UV-vis light), confirming electron-hole pair formation and CO2 electron scavenging. A small Si/TiO2/Pt electrode (1 x 1 cm) was employed in photoelectrocatalytic CO2 reduction, forming methanol (0.88 mmol L-1), ethanol (2.60 mmol L-1) and acetone (0.049 mmol L-1) as products reaching a Faradaic efficiency of 96.5%. These results had been obtained under the following optimal experimental conditions: 0.1 mol L-1 NaHCO3, pH 8 saturated with CO2, 125 W UV-vis irradiation (from 250 to 600 nm) and -0.8 V applied potential. Suitable charge transfer mechanisms in the electrode surface, and products formation after CO2 reduction, are proposed. (C) 2015 Published by Elsevier Ltd.
引用
收藏
页码:117 / 124
页数:8
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