Universal Equation for Argon Cluster Size-Dependence of Secondary Ion Spectra in SIMS of Organic Materials

被引:34
|
作者
Seah, Martin P. [1 ]
Havelund, Rasmus [1 ]
Gilmore, Ian S. [1 ]
机构
[1] Natl Phys Lab, Teddington TW11 0LW, Middx, England
来源
JOURNAL OF PHYSICAL CHEMISTRY C | 2014年 / 118卷 / 24期
关键词
MASS-SPECTROMETRY; STATIC SIMS; ENERGY; MULTILAYERS; EMISSION; DYNAMICS; YIELDS; CURVE; BEAMS;
D O I
10.1021/jp502646s
中图分类号
O64 [物理化学(理论化学)、化学物理学];
学科分类号
070304 ; 081704 ;
摘要
A study has been made of the fragmentation of three organic molecules, fluorenylmethyloxycarbonyl-L-pentafluorophenylalanine, tris(8-hydroxyquinolinato)aluminum, and Irganox 1010 under bombardment by argon cluster ions with sizes, n, between 500 and 10000 and for 10 and 20 keV energies, E. It is shown that the intensities of the fragments are governed by the same relation as that for the total volume sputtering yield but that, importantly, the parameter A(M) that governs the transition in behavior between low and high values of E/n is thought to be related to the energy required to remove that particular fragment from the ensemble of molecules. This causes a great reduction in intensity for the more strongly bound fragments as n is increased, such that, at n = 10000, the intensities of the molecular group peaks, which are weakly bound to the substrate, then dominate the spectrum. For studies involving weakly bound molecules, the low E/n values give the most intense molecular group peaks, but high E/n values give a greater number of small, characteristic fragments. For molecules more strongly bound to the bulk or substrate, it is not as likely that the low E/n data will be so helpful.
引用
收藏
页码:12862 / 12872
页数:11
相关论文
共 19 条
  • [11] Molecular depth profiling of multilayer structures of organic semiconductor materials by secondary ion mass spectrometry with large argon cluster ion beams
    Ninomiya, Satoshi
    Ichiki, Kazuya
    Yamada, Hideaki
    Nakata, Yoshihiko
    Seki, Toshio
    Aoki, Takaaki
    Matsuo, Jiro
    RAPID COMMUNICATIONS IN MASS SPECTROMETRY, 2009, 23 (20) : 3264 - 3268
  • [12] Characterization of drug-eluting stent (DES) materials with cluster secondary ion mass spectrometry (SIMS)
    Mahoney, Christine M.
    Patwardhan, Dinesh V.
    McDermott, M. Ken
    APPLIED SURFACE SCIENCE, 2006, 252 (19) : 6554 - 6557
  • [13] ToF-SIMS of OLED materials using argon gas cluster ion Beam: A promising approach for OLED inspection
    Baek, Ji Young
    Choi, Chang Min
    Lee, Sang Ju
    Min, Boo Ki
    Kang, Hwa Seung
    Choo, Dong Chul
    Sung, Ji Yeong
    Jin, Jong Sung
    Choi, Myoung Choul
    APPLIED SURFACE SCIENCE, 2020, 507
  • [14] Improved mass resolution and mass accuracy in TOF-SIMS spectra and images using argon gas cluster ion beams
    Shon, Hyun Kyong
    Yoon, Sohee
    Moon, Jeong Hee
    Lee, Tae Geol
    BIOINTERPHASES, 2016, 11 (02)
  • [15] Temperature-controlled depth profiling in polymeric materials using cluster secondary ion mass spectrometry (SIMS)
    Mahoney, Christine M.
    Fahey, Albert J.
    Gillen, Greg
    Xu, Chang
    Batteas, James D.
    APPLIED SURFACE SCIENCE, 2006, 252 (19) : 6502 - 6505
  • [16] Cluster ion beam generation from a wetted needle emitter for organic secondary ion mass spectrometry (organic SIMS) using a protic ionic liquid, propylammonium nitrate
    Fujiwara, Yukio
    Saito, Naoaki
    RAPID COMMUNICATIONS IN MASS SPECTROMETRY, 2018, 32 (21) : 1867 - 1874
  • [17] SECONDARY-ION MASS-SPECTROMETRY (SIMS) OF ORGANIC-COMPOUNDS .2. MASS-SPECTRA OF PEPTIDES
    WEYER, K
    KLOPPEL, KD
    VONBUNAU, G
    INTERNATIONAL JOURNAL OF MASS SPECTROMETRY AND ION PROCESSES, 1983, 51 (2-3): : 235 - 243
  • [18] Enhanced surface sensitivity in secondary ion mass spectrometric analysis of organic thin films using size-selected Ar gas-cluster ion projectiles
    Tanaka, Motohiro
    Moritani, Kousuke
    Hirota, Tomokazu
    Toyoda, Noriaki
    Yamada, Isao
    Inui, Norio
    Mochiji, Kozo
    RAPID COMMUNICATIONS IN MASS SPECTROMETRY, 2010, 24 (10) : 1405 - 1410
  • [19] Summary of ISO/TC 201 Standard: ISO 22415-Surface chemical analysis-Secondary ion mass spectrometry-Method for determining yield volume in argon cluster sputter depth profiling of organic materials
    Shard, Alexander G.
    Havelund, Rasmus
    Seah, Martin P.
    Clifford, Charles A.
    SURFACE AND INTERFACE ANALYSIS, 2019, 51 (10) : 1018 - 1020