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- [3] SIMS of Organic Materials—Interface Location in Argon Gas Cluster Depth Profiles Using Negative Secondary Ions Havelund, R. (rasmus.havelund@npl.co.uk), 1600, Springer Science and Business Media, LLC (29):
- [4] SIMS of Delta Layers in Organic Materials: Amount of Substance, Secondary Ion Species, Matrix Effects, and Anomalous Structures in Argon Gas Cluster Depth Profiles JOURNAL OF PHYSICAL CHEMISTRY C, 2016, 120 (46): : 26328 - 26335
- [6] Angle Dependence of Argon Gas Cluster Sputtering Yields for Organic Materials JOURNAL OF PHYSICAL CHEMISTRY B, 2015, 119 (07): : 3297 - 3303
- [7] Systematic Temperature Effects in the Argon Cluster Ion Sputter Depth Profiling of Organic Materials Using Secondary Ion Mass Spectrometry Seah, Martin P. (martin.seah@npl.co.uk), 1600, Springer Science and Business Media, LLC (27):