First-principles simulations of vibrational decay and lifetimes in a-Si:H and a-Si:D

被引:1
|
作者
Atta-Fynn, Raymond [1 ]
Drabold, David A. [2 ]
Elliott, Stephen R. [3 ]
Biswas, Parthapratim [4 ]
机构
[1] Univ Texas Arlington, Dept Phys, Arlington, TX 76019 USA
[2] Ohio Univ, Dept Phys & Astron, Athens, OH 45701 USA
[3] Univ Cambridge, Dept Chem, Cambridge CB2 1EW, England
[4] Univ Southern Mississippi, Dept Phys & Astron, Hattiesburg, MS 39406 USA
基金
美国国家科学基金会;
关键词
DEUTERATED AMORPHOUS-SILICON; MOLECULAR-DYNAMICS; STABILITY; HYDROGEN; ALLOY;
D O I
10.1103/PhysRevB.95.104205
中图分类号
T [工业技术];
学科分类号
08 ;
摘要
Phonon lifetime in materials is an important observable that conveys basic information about structure, dynamics, and anharmonicity. Recent vibrational transient-grating measurements, using picosecond infrared pulses from free-electron lasers, have demonstrated that the vibrational-population decay rates of localized high-frequency stretching modes (HSMs) in hydrogenated and deuterated amorphous silicon (a-Si:H/D) increase with temperature and the vibrational energy redistributes among the bending modes of Si in a-Si:H/D. Motivated by this observation, we address the problem from first-principles density-functional calculations and study the time evolution of the vibrational-population decay in a-Si:H/D, the average decay times, and the possible decay channels for the redistribution of vibrational energy. The average lifetimes of the localized HSMs in a-Si:H and a-Si:D are found to be approximately 51-92 ps and 50-78 ps, respectively, in the temperature range of 25-200 K, which are consistent with experimental data. A weak temperature dependence of the vibrational-population decay rates has been observed via a slight increase of the decay rates with temperature, which can be attributed to stimulated emission and increased anharmonic coupling between the normal modes at high temperature.
引用
收藏
页数:9
相关论文
共 50 条
  • [41] Thermalization gap of a-Si:H well layer in a-Si:H/a-Si3N4:H multilayers
    Murayama, K
    Katagiri, N
    Ouno, K
    Nakata, H
    Miyazaki, S
    Hirose, M
    JOURNAL OF NON-CRYSTALLINE SOLIDS, 2000, 266 : 1072 - 1076
  • [42] THz photoconductivity in a-Si:H
    Shimakawa, Koichi
    Wagner, Tomas
    Frumar, Miloslav
    PHYSICA STATUS SOLIDI B-BASIC SOLID STATE PHYSICS, 2013, 250 (05): : 1004 - 1007
  • [43] EXCITATION WAVELENGTH AND INTENSITY DEPENDENCE OF LUMINESCENCE DECAY IN A-SI(H)
    SHAH, J
    BAGLEY, BG
    ALEXANDER, FB
    SOLID STATE COMMUNICATIONS, 1980, 36 (03) : 199 - 203
  • [44] Vacancy-like defects in a-Si: a first principles study
    Miranda, CR
    Antonelli, A
    da Silva, AJR
    Fazzio, A
    JOURNAL OF NON-CRYSTALLINE SOLIDS, 2004, 338 : 400 - 402
  • [45] Effect of light degradation on nanosecond photoluminescence decay in a-Si:H
    Gangopadhyay, S.
    Palsule, C.
    Borst, W.
    Journal of Non-Crystalline Solids, 1991, 137-38 (pt 1) : 539 - 542
  • [46] Impact of a-Si:H hydrogen depth profiles on passivation properties in a-Si:H/c-Si heterojunctions
    Schulze, T. F.
    Korte, L.
    Rech, B.
    THIN SOLID FILMS, 2012, 520 (13) : 4439 - 4444
  • [47] Geminate recombination in a-Si:H
    Stachowitz, R.
    Bort, M.
    Carius, R.
    Fuhs, W.
    Liedtke, S.
    Journal of Non-Crystalline Solids, 1991, 137-38 (pt 1) : 551 - 554
  • [48] Solution of the μτ problem in a-Si:H
    Kocka, J.
    Nebel, C.E.
    Abel, C.D.
    Philosophical Magazine B: Physics of Condensed Matter; Electronic, Optical and Magnetic Properties, 1991, 63 (01): : 221 - 246
  • [49] Drivers with a-Si:H TFTs
    Maurice, F.
    Lebrun, H.
    Kretz, T.
    ITG-Fachbericht, 1998, 150 : 129 - 132
  • [50] Influence of the precursor materials on the process of aluminium induced crystallisation of a-Si and a-Si:H
    Grigorov, V.
    Angelov, O.
    Sendova-Vassileva, M.
    Dimova-Malinovska, D.
    THIN SOLID FILMS, 2006, 511 (381-384) : 381 - 384