Femtosecond laser-induced damage in reflector

被引:4
|
作者
Sun, Haiyi
Jia, Tianqing
Li, Xiaoxi
Li, Chengbin
Feng, Donghai
Xu, Shizhen
Ge, Xiaochun
Xu, Zhizhan
机构
[1] Chinese Acad Sci, Shanghai Inst Opt & Fine Mech, State Key Lab High Field Laser Phys, Shanghai 201800, Peoples R China
[2] Univ Tokyo, Inst Solid State Phys, Kashiwa, Chiba 2778581, Japan
基金
中国国家自然科学基金;
关键词
45 degrees high-reflection mirror; femtosecond laser; damage threshold; ablation depth;
D O I
10.1016/j.apsusc.2005.07.048
中图分类号
O64 [物理化学(理论化学)、化学物理学];
学科分类号
070304 ; 081704 ;
摘要
We have investigated the damage for ZrO2/SiO2 800 nm 45 degrees high-reflection mirror with femtosecond pulses. The damage morphologies and the evolution of ablation crater depths with laser fluences are dramatically different from that with pulse longer than a few tens of picoseconds. The ablation in multilayers occurs layer by layer, and not continuously as in the case of bulk single crystalline or amorphous materials. The weak point in damage is the interface between two layers. We also report its single-short damage thresholds for pulse durations ranging from 50 to 900 fs, which departs from the diffusion-dominated tau(1/2)(p) scaling. A developed avalanche model, including the production of conduction band electrons (CBE) and laser energy deposition, is applied to study the damage mechanisms. The theoretical results agree well with our measurements. (c) 2005 Elsevier B.V. All rights reserved.
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页码:5109 / 5115
页数:7
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