The analysis of chromium, cobalt, iron, nickel, niobium, tantalum, titanium and zinc in cemented tungsten carbides with cobalt as a binder by inductively coupled plasma atomic emission spectrometry
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作者:
Piippanen, T
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机构:University of Jyväskylä, Department of Chemistry, FIN-40351 Jyväskylä
Piippanen, T
Jaatinen, J
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机构:University of Jyväskylä, Department of Chemistry, FIN-40351 Jyväskylä
Jaatinen, J
Tummavuori, T
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机构:University of Jyväskylä, Department of Chemistry, FIN-40351 Jyväskylä
Tummavuori, T
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[1] University of Jyväskylä, Department of Chemistry, FIN-40351 Jyväskylä
Inductively coupled plasma atomic emission spectrometry (ICP-AES) was applied as a rapid routine method for the analysis of cemented tungsten carbides. Chromium, cobalt, iron, nickel, niobium, tantalum, titanium and zinc were selected as major, minor and trace constituents in the material investigated. In the first step, the sample was treated with hydrochloric and orthophosphoric acid. The second step consisted of the simultaneous addition of hydrofluoric and nitric acids. Cemented tungsten carbides dissolved completely, leaving only minor quantities of carbon in the solution. Multiple linear regression proved to be very effective in the search for interfering elements. Using simple acid based standards, all the elements investigated could be determined individually from the complicated matrix using an appropriate method of calculation. The method described was successfully applied to real type commercial samples. The advantages of the ICP-AES method in comparison with the XRF-method are discussed.
机构:
Hebei HBIS Mat Technol Res Inst Co Ltd, Shijiazhuang 050000, Hebei, Peoples R ChinaHebei HBIS Mat Technol Res Inst Co Ltd, Shijiazhuang 050000, Hebei, Peoples R China
Liu Jie
Tan Sheng-nan
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Hebei HBIS Mat Technol Res Inst Co Ltd, Shijiazhuang 050000, Hebei, Peoples R ChinaHebei HBIS Mat Technol Res Inst Co Ltd, Shijiazhuang 050000, Hebei, Peoples R China
Tan Sheng-nan
Qi Zhen-nan
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Hebei HBIS Mat Technol Res Inst Co Ltd, Shijiazhuang 050000, Hebei, Peoples R ChinaHebei HBIS Mat Technol Res Inst Co Ltd, Shijiazhuang 050000, Hebei, Peoples R China
Qi Zhen-nan
Ren Ling-ling
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Hebei HBIS Mat Technol Res Inst Co Ltd, Shijiazhuang 050000, Hebei, Peoples R ChinaHebei HBIS Mat Technol Res Inst Co Ltd, Shijiazhuang 050000, Hebei, Peoples R China
Ren Ling-ling
Ge Jing-jing
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Hebei HBIS Mat Technol Res Inst Co Ltd, Shijiazhuang 050000, Hebei, Peoples R ChinaHebei HBIS Mat Technol Res Inst Co Ltd, Shijiazhuang 050000, Hebei, Peoples R China
Ge Jing-jing
Sun Zhong-hua
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Hebei HBIS Mat Technol Res Inst Co Ltd, Shijiazhuang 050000, Hebei, Peoples R ChinaHebei HBIS Mat Technol Res Inst Co Ltd, Shijiazhuang 050000, Hebei, Peoples R China