Nonempirical design of rapid thermal processing system

被引：3

作者：

Habuka, H ^{[1
]}

Suzuki, T ^{[1
]}

Sakurai, T ^{[1
]}

Negishi, Y ^{[1
]}

Takeuchi, T ^{[1
]}

机构：

[1] Yokohama Natl Univ, Dept Chem Engn Sci, Yokohama, Kanagawa 2408501, Japan

来源：

JAPANESE JOURNAL OF APPLIED PHYSICS PART 1-REGULAR PAPERS SHORT NOTES & REVIEW PAPERS | 2001年 / 40卷 / 12期

关键词：

silicon; rapid thermal processing; ray tracing method; nonempirical furnace design;

D O I：

10.1143/JJAP.40.7123

中图分类号：

O59 [应用物理学];

学科分类号：

摘要：

In order to develop a nonempirical technology to design a rapid thermal processing (RTP) system, a direct approach model using the ray tracing simulation (DARTS) is applied far designing the small RTP system composed of tungsten/halogen filament lamps, specular reflectors and a silicon wafer. The temperature profiles on the silicon wafer surface are theoretically predicted and experimentally evaluated using the two RTP systems. The quantitative agreement of the theoretically predicted and experimentally evaluated temperature profiles on the silicon surface suggests that the nonempirical design of the RTP system is possible using the DARTS model. The reflection-resolved analysis based on this model is considered to provide information on the entire path of the rays from the lamps to the silicon wafer surface and on the heat loss caused by the reflectors in the RTP system.

引用

页码：7123 / 7128

页数：6

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