New advanced lithography tools with mix-and-match strategy

被引：3

作者：

Ishikawa, J ^{[1
]}

Nei, M ^{[1
]}

Hamatani, M ^{[1
]}

Wakamoto, S ^{[1
]}

Umatate, T ^{[1
]}

机构：

[1] Nikon Inc, Kumagaya 3608559, Japan

来源：

OPTICAL MICROLITHOGRAPHY XVII, PTS 1-3 | 2004年 / 5377卷

关键词：

Nikon; mix-and-match; lithography tools; NSR-S307E ArF scanner; NSR-S207D KrF scanner; NSR-SF200 KrF stepper;

D O I：

10.1117/12.537214

中图分类号：

O43 [光学];

学科分类号：

070207 ; 0803 ;

摘要：

Both cost reduction and precision control are required for today's semiconductor manufacturing process. Nikon has developed cutting-edge lithography tools, and its product lineup encompasses all exposure wavelengths. The new products are: the NSR-S307E, an ArF scanner for the 90nm lithography; the NSR-S207D, a KrF scanner for the 110nm lithography; and the NSR-SF200, a KrF stepper for noncritical layers. These systems offer unparalleled productivity and cost performance. Nikon also provides a powerful support system - the Lithography Equipment Engineer System (LEES). Nikon customers can use all of these tools simultaneously to reach the maximum benefit of machine uptime and enable the combined performance of the machines to exceed that of a stand-alone tool. Recent actual performance data from each of the tools and the Lithography Equipment Engineer System(LEES), as well as the latest mix-and-match results, are reported.

引用

页码：798 / 805

页数：8

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