DEVELOPING A WORKING MIX-AND-MATCH LITHOGRAPHY SYSTEM.

被引：0
|
作者：
Lent, John [1 ]
机构：
[1] Signetics, Albuquerque, NM, USA, Signetics, Albuquerque, NM, USA
来源：
Semiconductor International | 1985年 / 8卷 / 09期
关键词：
LITHOGRAPHY; -; Applications;
D O I：
暂无
中图分类号：
学科分类号：
摘要：
This article relates the problems and pains encountered with adding mix-and-match at an electronics company. Results of preliminary testing that gave the green light to proceed with mix-and-match are reported. The method used to demonstrate the feasibility of overlay accuracy of each system and the total system is discussed, along with different alignment schemes used, the merits of each scheme and the universal alignment method used to interface the two systems at any level and at any time in the product life cycle without the need to restrategize 1X plates.
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页码：146 / 149
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