Key performance-limiting defects in p-on-n HgCdTe LPE heterojunction infrared photodiodes

被引:25
|
作者
Chen, MC
List, RS
Chandra, D
Bevan, MJ
Colombo, L
Schaake, HF
机构
[1] Texas Instruments Incorporated, Corporate Research and Development, MS 150, Dallas, TX 75265
关键词
defects; double layer heterojunction (DLHJ); HgCdTe; liquid phase epitaxy (LPE); metallurgical defects; p-on-n diodes;
D O I
10.1007/BF02655037
中图分类号
TM [电工技术]; TN [电子技术、通信技术];
学科分类号
0808 ; 0809 ;
摘要
The operability of long-wavelength p-on-n double layer heterojunction arrays for 40K low-background applications has long been limited by the wide variation in pixel-to-pixel zero bias resistance (R(0)) values. Diodes on test structures showing lower performance, with R(0) values below 7 x 10(6) ohm at 40K, usually contained gross metallurgical defects such as dislocation clusters and loops, pin holes, striations, Te inclusions, and heavy terracing. However, diodes with R(0) values between 7 x 10(6) and 1 x 10(9) ohm at 40K contained no visible defects. To study the ''invisible'' performance-limiting defects (i.e. defects that cannot be revealed by etching), a good correlation between the dynamic resistance at 50 mV reverse bias (R50) value at 77K and the R(0) value at 40K was first established, and then used as a tool. The correlation allowed measurements of a large number of devices at 77K, rather than relying exclusively on time-consuming measurements at 40K, Interesting results regarding R(0) values at 40K, such as insensitivity to low-density dislocations, mild degradation from Hg vacancies, severe degradation from Hg interstitials, and correlation with junction positioning, were obtained from specially designed experiments.
引用
收藏
页码:1375 / 1382
页数:8
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