Magnetism in Cr2O3 Thin Films: An Ab Initio Study

被引：3
|
作者：
Choudhary, Renu [1 ]
Skomski, Ralph [2 ]
Kashyap, Arti [1 ]
机构：
[1] IIT Mandi, Sch Basic Sci, Mandi 175005, India
[2] Nebraska Ctr Mat & Nanosci, Dept Phys & Astron, Lincoln, NE 68588 USA
来源：
IEEE TRANSACTIONS ON MAGNETICS | 2015年 / 51卷 / 11期
关键词：
Cr2O3; film; local moment; spin structure and ferrimagnetism; 0001; SURFACE;
D O I：
10.1109/TMAG.2015.2435035
中图分类号：
TM [电工技术]; TN [电子技术、通信技术];
学科分类号：
0808 ; 0809 ;
摘要：
The magnetism of Cr2O3 thin films on alpha-Al2O3 is investigated using first-principle calculations by considering three Cr2O3 films having thicknesses of 4.1 angstrom (I), 6.7 angstrom (II), and 10.9 angstrom (III) and comparing the spin structures of free films with those on the substrate. For the free films, we find that I is ferromagnetic (FM), while II and III are antiferromagnetic (AFM). On the substrate, the Cr2O3 film I is also FM. Films II and III remain basically AFM, although the spins of the top Cr layers change sign in both films, creating a ferrimagnet with a small uncompensated net moment.
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页数：3
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