Calculation of electric fields induced near metal implants by magnetic resonance imaging switched-gradient magnetic fields

被引:13
|
作者
Buechler, DN [1 ]
Durney, CH [1 ]
Christensen, DA [1 ]
机构
[1] UNIV UTAH,DEPT ELECT ENGN,SALT LAKE CITY,UT 84112
关键词
magnetic resonance imaging; metallic implants; induced electric fields; safety;
D O I
10.1016/S0730-725X(97)00179-3
中图分类号
R8 [特种医学]; R445 [影像诊断学];
学科分类号
1002 ; 100207 ; 1009 ;
摘要
Electric (E) fields induced near metal implants by MRI switched-gradient magnetic fields are calculated by a new equivalent-circuit numerical technique. Induced E-field results are found for a metallic spinal-fusion implant consisting of two thin wires connected to the metallic case of a current generator as well as for its subsections: a bare U-shaped wire, an insulated U-shaped wire, a cut insulated wire, and a generator. The presence of the metallic implants perturbs the E field significantly. Near the ends of the bare U-shaped wire, the E field is 89.7 times larger than in the absence of the wire. The greatest E field concentration occurs near the ends of the cut insulated wire, where the E field is 196.7 times greater than in the absence of the wire. In all cases, the perturbation of the induced E field by the implanted wire is highly localized within a few diameters of the wire. (C) 1997 Elsevier Science Inc.
引用
收藏
页码:1157 / 1166
页数:10
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