Thin films of potassium niobate were deposited on (100) Si substrates by the polymeric precursor method (Pechini method). Annealing in static air was performed at 600degrees C for 20 h. The obtained films were characterized by X-ray diffraction and atomic force microscopy (AFM). Electrical characterization of the films pointed to ferroelectricity via hysteresis loop. The dielectric constant, dissipation factor and resistance were measured in frequency region from 10 Hz to 10 MHz. At 1 MHz, the dielectric constant was 158 and the dissipation factor was 0.11. (C) 2004 Elsevier B.V. All rights reserved.
机构:
Jozef Stefan Inst, Ljubljana 1000, Slovenia
Ctr Excellence NAMASTE, Ljubljana 1000, SloveniaJozef Stefan Inst, Ljubljana 1000, Slovenia
Kupec, Alja
Gemeiner, Pascale
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Ecole Cent Paris Grande Voie Vignes, CNRS UMR 8580, Lab Struct Proprietes & Modelisat Sol, F-92925 Chatenay Malabry, FranceJozef Stefan Inst, Ljubljana 1000, Slovenia
Gemeiner, Pascale
Dkhil, Brahim
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Ecole Cent Paris Grande Voie Vignes, CNRS UMR 8580, Lab Struct Proprietes & Modelisat Sol, F-92925 Chatenay Malabry, FranceJozef Stefan Inst, Ljubljana 1000, Slovenia