Graphene and Thin-Film Semiconductor Heterojunction Transistors Integrated on Wafer Scale for Low-Power Electronics

被引:68
|
作者
Heo, Jinseong [1 ]
Byun, Kyung-Eun [1 ]
Lee, Jaeho [1 ]
Chung, Hyun-Jong [1 ]
Jeon, Sanghun [1 ]
Park, Seongjun [1 ]
Hwang, Sungwoo [1 ]
机构
[1] Samsung Elect Co, Samsung Adv Inst Technol, Yongin 446712, Gyeonggi Do, South Korea
关键词
Graphene; thin-film semiconductor; heterojunction transistor; wafer-scale integration; low-power electronics; TUNNELING TRANSISTOR; FIELD; HETEROSTRUCTURES; FABRICATION; DEVICE;
D O I
10.1021/nl403142v
中图分类号
O6 [化学];
学科分类号
0703 ;
摘要
Graphene heterostructures in which graphene is combined with semiconductors or other layered 2D materials are of considerable interest, as a new class of electronic devices has been realized. Here we propose a technology platform based on graphene thin-film-semiconductor metal (GSM) junctions, which can be applied to large-scale and power-efficient electronics compatible with a variety of substrates. We demonstrate wafer-scale integration of vertical field-effect transistors (VFETs) based on graphene In-Ga-Zn-O (IGZO)-metal asymmetric junctions on a transparent 150 x 150 mm(2) glass. In this system, a triangular energy barrier between the graphene and metal is designed by selecting a metal with a proper work function. We obtain a maximum current on/off ratio (I-on/I-off) up to 106 with an average of 3010 over 2000 devices under ambient conditions. For low-power logic applications, an inverter that combines complementary n-type (IGZO) and p-type (Ge) devices is demonstrated to operate at a bias of only 0.5 V.
引用
收藏
页码:5967 / 5971
页数:5
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