Seamless Pattern Fabrication of Large-Area Nanostructures Using Ultraviolet Nanoimprint Lithography

被引：8

作者：

Kataza, Shingo ^{[1
]}

Ishibashi, Kentaro ^{[2
]}

Kokubo, Mitsunori ^{[2
]}

Goto, Hiroshi ^{[2
]}

Mizuno, Jun ^{[1
]}

Shoji, Shuichi ^{[1
]}

机构：

[1] Waseda Univ, Sch Adv Sci & Engn, Shinjuku Ku, Tokyo 1698555, Japan

[2] Toshiba Machine Co Ltd, Shizuoka 4108510, Japan

来源：

JAPANESE JOURNAL OF APPLIED PHYSICS | 2009年 / 48卷 / 06期

关键词：

LIGHT-EMITTING-DIODES; IMPRINT;

D O I：

10.1143/JJAP.48.06FH21

中图分类号：

O59 [应用物理学];

学科分类号：

摘要：

The seamless pattern fabrication of large-area nanostructures using ultraviolet nanoimprint lithography (UV-NIL) was studied. Large-area nanopatterning is required in the actual mass production of optical devices and biological microchips. We applied the double lithography method of litho-etch-litho-etch for UV-NIL process. The proposed multiple UV-NIL process realized 66 x 45 mm(2) pattern area, which has 50 nm width and 150 nm space line patterns on a quartz wafer. (C) 2009 The Japan Society of Applied Physics

引用

页码：06FH211 / 06FH213

页数：3

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