Compression plasma flows modification of surface layers in the system "Ti-Si": Phase composition, structure and element redistribution

被引：3

作者：

Uglov, V. V. ^{[1
]}

Kvasov, N. T. ^{[1
]}

Kudaktsin, R. S. ^{[2
]}

Petukhou, Yu. A. ^{[1
]}

Ermalitskaya, K. F. ^{[1
]}

Astashynski, V. M. ^{[2
]}

Kuzmitski, A. M. ^{[2
]}

机构：

[1] Belarusian State Univ, Minsk 220030, BELARUS

[2] Natl Acad Sci Belarus, AV Lykov Heat & Mass Transfer Inst, Minsk 220072, BELARUS

来源：

SURFACE & COATINGS TECHNOLOGY | 2013年 / 235卷

关键词：

Compression plasma flows; Titanium silicide; Diffusion; Convection; Protective coatings; MICROSTRUCTURE; TI5SI3; SUBSTRATE;

D O I：

10.1016/j.surfcoat.2013.08.047

中图分类号：

TB3 [工程材料学];

学科分类号：

0805 ; 080502 ;

摘要：

In the present study Ti5Si3/Si layers synthesized by compression plasma flows treatment (treatment time similar to 100 mu s) of the system "titanium coating (1 mu m) - silicon substrate" are studied. XRD, SEM and LAES were employed to characterize the phase composition, structure and elemental distribution of these layers. It has been found that plasma energy density (Q) dominates peculiarities of layer structure and elemental distribution. For Q < 5 J/cm(2) layers of thickness up to 2 mu m with diffusive element distribution form. For 5 J/cm(2) < Q < 8 J/cm(2) layers of thickness up to 10 mu m with as convective as diffusive element distribution form. For Q > 8 J/cm(2) layers of thickness up to 25 mu m with convective element distribution form. Silicon dendrites grow in modified layer and eutectics Ti5Si3/Si is localized in interdendritic space. The mechanisms of structure formation and element redistribution are discussed in detail. (C) 2013 Elsevier B.V. All rights reserved.

引用

页码：685 / 690

页数：6

共 33 条

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