Next generation interferometry for optical figure metrology

被引：0
|
作者：
Evans, CJ [1 ]
机构：
[1] Natl Inst Stand & Technol, Automated Prod Technol Div, Gaithersburg, MD 20899 USA
来源：
PRECISION ENGINEERING, NANOTECHNOLOGY, VOL. 2 | 1999年
关键词：
D O I：
暂无
中图分类号：
T [工业技术];
学科分类号：
08 ;
摘要：
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收藏
页码：307 / 307
页数：1
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